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Unstress Replenishing mask 50ml CHR765

€86,5

Christina Unstress Replenishing Mask

1 in stock

SKU: CHR765 Category: Mask
  • Description
  • Additional information

Description

UNSTRESS Replenishing Mask is a skincare treatment that enhances skin firmness and strengthens its structure at both the epidermal and cellular levels. The mask softens the skin while effectively reducing irritation, flaking, redness, and itching. It provides long-lasting hydration, supports skin regeneration, and promotes recovery.

Specially formulated for skin exposed to aggressive factors, it is recommended for use when the skin is damaged due to excessive sun exposure, wind, or cosmetic procedures such as peeling and laser resurfacing.

With a light, creamy texture, the mask absorbs quickly, leaving the skin feeling comfortable. It is recommended to apply the mask several times a week on cleansed skin. For an extra nourishing effect, it can also be left on overnight.

How to use:

Apply to cleansed skin twice a week for 10-15 minutes, then rinse with warm water and apply a serum and/or cream. It can also be left on overnight.

Ingredients:

Deionized water (Aqua), Cetearyl Alcohol&, Cetearyl Glucoside&, Deionized water (Aqua)&, Glucose, Cetearyl Ethylhexanoate, 1,2-Hexanediol&, Caprylyl Glycol&, Deionized water (Aqua)&, Sodium hyaluronate, Glycerin, Iron Oxide (CI 77492)&, Zinc carbonate (CI 77950), Ammonium Polyacryloyldimethyl Taurate&, Cyclopentasiloxane&, Dimethicone&, Isohexadecane&, Polysilicone-11&, Polysorbate 20&, Polysorbate 80&, Tocopheryl Acetate, Citric Acid&, Deionized water (Aqua)&, Saccharide Isomerate&, Sodium Citrate, Cetearyl Alcohol, Butylene Glycol&, Cucumis Sativus (Cucumber) Fruit Extract&, Deionized water (Aqua)&, Glycerin, Butyrospermum Parkii (Shea) Butter, Glycerin&, Phenoxyethanol&, Potassium Sorbate&, Thermus Thermophillus Ferment, Cyclopentasiloxane, Caprylyl Glycol&, Phenoxyethanol, Deionized water (Aqua)&, Glycerin&, Plumeria Alba Flower Extract&, Potassium Sorbate&, Sorbic Acid, Deionized water (Aqua)&, Glycerin&, Magnesium Ascorbyl Phosphate&, Phenoxyethanol&, Sodium Benzoate&, Sodium Metabisulfite&, Arbutin, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Caprylyl Glycol, Deionized water (Aqua)&, Isohexadecane&, Polysorbate 80&, Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer&, Sorbitan Oleate, Triethanolamine, Allantoin, Chlorphenesin, Tocopheryl Acetate, Linoleic Acid&, Linolenic Acid, Oleic Acid&, Tocopherol, Fragrance, Anise Alcohol, Benzyl Alcohol, Benzyl Benzoate, Benzyl Salicylate, Butylphenyl Methylpropional, Citral, Farnesol, Geraniol, Isoeugenol, Limonene, Linalool

Additional information

Линии косметики

Unstress

Тип препарата

Mask

Решение проблем

Couperose, Damaged skin, Dryness, Sensitive skin, Skin peeling

Tип Кожи

Any, Combination, Dry, Normal, Oily

Эффект

Anti-inflammatory, Brightening, Hydration, Nourishment, Regeneration, Soothing

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